Coating system with multi-coating techniques as Plasma Enhanced Chemical Vapor Deposition (PECVD), RF Magnetron Sputtering and Thermal Evaporation, the ultimate vacuum is 10-5 Torr at > 30 minutes. System is supported with four mass flow controllers to feed gas after getting the ultimate vacuum with finite flow rate.
System may be operating with RF or DC power source with a desired power. Magnetron sputtering gun with 2 inch target diameter supported with cooling water can be connected electrically to RF or DC power source is attached also to the system.
Three Coating techniques (Magnetron Sputtering, Thermal Evaporation and PECVD) are working separately.